methods are limited in their ability to do precise overlay . In 1999, Willson and Sreenivasan developed step and flash imprint lithography (S-FILTM) . The use of a quartz template opens up the potential for optical alignment of the wafer and template . This paper reviews several key aspects of the S-FIL process, including template, tool, ultraviolet (UV)curable monomer, and pattern transfer . Two applications are also presented : contact holes and surface acoustic wave (SAW) filters . aMotorola…
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